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    CANADIAN CLEAR ULTRA PURE WATER

    Canadian Clear Offers Solutions For Ultra Pure Water Ultrapure Water (upw) Is Water That Has Been Purified To Very Strict Specifications, Containing By Definition Only H20, And H+ And Oh- Ions In Equilibrium. Therefore, Ultrapure Water Conductivity Is About 0,055 Us/cm At 25oc, Also Expressed As Resistivity Of 18,2 Mohm.Ultra Pure Water Is Mainly Used In The Semi-conductor And Pharmaceutical Industry.Ultrapure Water Production Often Is Produced Through Processes Like Membrane Filtration Or Ion Exchange To Reach The Ultimate Conductivity Of 10 Us/cm. The Demineralised Water Is Then Processed Through A High-performance Mixed Bed Or By Electrodeionization Membrane Degasification Is Used To Degasify Water


    Industrial Process Water At a Glance

    • Semiconductor Industry
    • Nuclear Power Plants
    • Pharma
    • Hospitals

    Semiconductor

    Ultrapure water (UPW) for semiconductor industry

    In the production of plasma displays, chips and integrated circuits, water of very high quality is necessary for certain process steps.

    Typical scheme of a UPW production system
    UPW production requires an integration of several treatment technologies including reverse osmosis, electro-deionization and ion exchange.

    A well designed UPW system requires a strategic selection of technologies and equipment. Depending on the feed water quality and/or the user requirements, different configurations can be applied.Please contact us for more information.

    UPW quality guidelines

    The ASTM (American Society for Testing and Materials) differentiate several gradations of purity for the semiconductor industRYM

    Parameter Type E.1 Type 1.1 Type 1.2
    Linewidth 1.0-0.5 0.35-0.25 0.18-0.09
    Resistivity, 25o MΩ.cm 18.1 18.2 18.2
    TOC (μg/L) (on-line for) 5 2 1
    On-line dissolved oxygen (μg/L) 25 10 3
    On-Line Residue after evaporation (μg/L) 1 0.5 0.1
    SEM particles
    0.1-0.2 µm
    0.2-0.5 µm
    0.5-0.1 µm
    10 µm     		1.000
    500
    100<50     		700
    400
    50<30    		 <250
    <100

    <30
    <10
    Bacteria in CFU/Volume
    100 mL Sample
    1L Sample
    10L Sample     		5 3 1
    10
    Silica
    Total (μg/L)
    Dissolved (μg/L)
    5
    3
    3
    1
    1
    0.5
    Anions and Ammonium by IC (μg/L)
    Ammonium
    Bromide
    Chloride
    Fluoride
    Nitrate
    Nitrite
    Phosphate
    Sulfate     		0.1
    0.1
    0.1
    0.1
    0.1
    0.1
    0.1
    0.1
    0.1     		0.1
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5    		 0.05
    0.02
    0.02
    0.03
    0.02
    0.02
    0.02
    0.02
    0.02
    Metals by ICP/MS (μg/L)
    Aluminum
    Antimony
    Arsenic
    Barium
    Boron
    Cadmium
    Calcium
    Chromium
    Copper
    Iron
    Lead
    Lithium
    Magnesium
    Manganese
    Nickel
    Potassium
    Sodium
    Strontium
    Tin
    Titanium
    Vanadium
    Zinc
    0.5


    0.5
    0.3
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5
    0.5     		0.02


    0.02
    0.2
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02    		 0.002


    0.002
    0.002
    0.002
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02
    0.02

    Note: The values in this table are guidelines provided by ASTM. The guidelines will be revised whenever the semiconductor industry develops new linewidths Please consult ASTM website for updates on these values. The requirements of high-end use are classified in type E-1.1 and type E-1.2.

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