ULTRA PURE WATER

CANADIAN CLEAR ULTRA PURE WATER

Canadian Clear Offers Solutions For Ultra Pure Water Ultrapure Water (upw) Is Water That Has Been Purified To Very Strict Specifications, Containing By Definition Only H20, And H+ And Oh- Ions In Equilibrium. Therefore, Ultrapure Water Conductivity Is About 0,055 Us/cm At 25oc, Also Expressed As Resistivity Of 18,2 Mohm.Ultra Pure Water Is Mainly Used In The Semi-conductor And Pharmaceutical Industry.Ultrapure Water Production Often Is Produced Through Processes Like Membrane Filtration Or Ion Exchange To Reach The Ultimate Conductivity Of 10 Us/cm. The Demineralised Water Is Then Processed Through A High-performance Mixed Bed Or By Electrodeionization Membrane Degasification Is Used To Degasify Water


Industrial Process Water At a Glance

  • Semiconductor Industry
  • Nuclear Power Plants
  • Pharma
  • Hospitals

Semiconductor

Ultrapure water (UPW) for semiconductor industry

In the production of plasma displays, chips and integrated circuits, water of very high quality is necessary for certain process steps.

Typical scheme of a UPW production system
UPW production requires an integration of several treatment technologies including reverse osmosis, electro-deionization and ion exchange.

A well designed UPW system requires a strategic selection of technologies and equipment. Depending on the feed water quality and/or the user requirements, different configurations can be applied.Please contact us for more information.

UPW quality guidelines

The ASTM (American Society for Testing and Materials) differentiate several gradations of purity for the semiconductor industRYM

Parameter Type E.1 Type 1.1 Type 1.2
Linewidth 1.0-0.5 0.35-0.25 0.18-0.09
Resistivity, 25o MΩ.cm 18.1 18.2 18.2
TOC (μg/L) (on-line for) 5 2 1
On-line dissolved oxygen (μg/L) 25 10 3
On-Line Residue after evaporation (μg/L) 1 0.5 0.1
SEM particles
0.1-0.2 µm
0.2-0.5 µm
0.5-0.1 µm
10 µm
1.000
500
100<50
700
400
50<30
<250
<100

<30
<10
Bacteria in CFU/Volume
100 mL Sample
1L Sample
10L Sample
5 3 1
10
Silica
Total (μg/L)
Dissolved (μg/L)

5
3

3
1

1
0.5
Anions and Ammonium by IC (μg/L)
Ammonium
Bromide
Chloride
Fluoride
Nitrate
Nitrite
Phosphate
Sulfate
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.05
0.02
0.02
0.03
0.02
0.02
0.02
0.02
0.02
Metals by ICP/MS (μg/L)
Aluminum
Antimony
Arsenic
Barium
Boron
Cadmium
Calcium
Chromium
Copper
Iron
Lead
Lithium
Magnesium
Manganese
Nickel
Potassium
Sodium
Strontium
Tin
Titanium
Vanadium
Zinc

0.5


0.5
0.3
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.5
0.02


0.02
0.2
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.002


0.002
0.002
0.002
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02
0.02

Note: The values in this table are guidelines provided by ASTM. The guidelines will be revised whenever the semiconductor industry develops new linewidths Please consult ASTM website for updates on these values. The requirements of high-end use are classified in type E-1.1 and type E-1.2.